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Swayam Central

Fundamentals of micro and nanofabrication

By Prof.Shankar Kumar Selvaraja & Prof. Sushobhan Avasti   |   IISc Bangalore
The course provides an in-depth understanding of top-down device fabrication. Focus is the unit processes typically used in micro & nanofabrication of devices. Both concepts and practical aspects are covered. Topics include crystal growth, doping, chemical vapor deposition, physical vapor deposition, photolithography, wet etching, dry etching, and packaging. The course is accessible to students from diverse backgrounds, such as materials, physics, chemistry, mechanical engineering, and electrical engineering.The course will be a derivative of NE203: Advanced Micro & Nano Fabrication Technology & Processes. Students from various departments outside CeNSE, e.g. Physics, Chemistry, ECE, DESE, IAP, routinely take the course. 

INTENDED AUDIENCE : Masters students interested in fundamentals of top-down micro and nanodevice fabrication
PREREQUISITES:           General background in physics, chemistry, materials, chemical engineering, mechanical engineering,
                                         or electronic engineering should be enough.
INDUSTRY SUPPORT :   Electronic Device Manufacturing

SUMMARY

Course Status : Upcoming
Course Type : Elective
Duration : 12 weeks
Start Date : 29 Jul 2019
End Date : 18 Oct 2019
Exam Date : 17 Nov 2019
Category :
  • Electrical, Electronics and Communications Engineering
  • Level : Postgraduate
    This is an AICTE approved FDP course

    COURSE LAYOUT

    Week 1: Introduction to micro-fabrication
    Week 2: Substrate
    Week 3: Cleaning
    Week 4: Additive processing: Doping
    Week 5: Additive processing: Native Films
    Week 6: Additive processing: CVD
    Week 7: Additive processing: PVD
    Week 8: Lithography 1
    Week 9: Lithography 2
    Week 10: Subtractive Process: Wet Etching
    Week 11: Subtractive Process: Dry Etching
    Week 12: CMP and Packaging


    BOOKS AND REFERENCES

    1.The Science and Engineering of Microelectronic Fabrication by Stephen A.  Campbell 
    2.VLSI Fabrication Principles: Silicon and Gallium Arsenide by Sorab K. Gandhi
    3.Introduction to Microelectronic Fabrication by Richard C. Jaeger
    4.Materials Science of Thin Films by Milton Ohring
    5.Fundamentals of Microfabrication and Nanotechnology, by Marc J. Madou
    6.Fundamental Principles of Optical Lithography by Chris Mack
    7.Electronic Materials by Prof. Dr. Helmut Föll

    INSTRUCTOR BIO



    Dr.Shankar Kumar Selvaraja obtained B.E. Electronics and Communication Engineering from Dr. MCET, Pollachi, Bharathiar University, M.E. Optical Communication from College of Engineering, Anna University, Chennai, M. S. Microelectronics and Microsystems from University of Twente, The Netherlands and Ph.D. in Photonics Engineering from Ghent University, Belgium in 2011. His doctoral thesis was carried out at imec (inter-university microelectronics center), Leuven, Belgium on wafer-scale fabrication technology for Silicon photonic integrated circuits. He was supported by Dehouse doctoral grant and scientific leadership training award to conduct his doctoral work. Between 2011 and 2014, he worked at imec, Belgium developing next-generation microprocessor for high-speed computing using Silicon photonic integrated circuits. He has spent a decade in the area of silicon photonic developing state-of-the-art process and device technology for Silicon Complementary-Metal-Oxide-Semiconductor (CMOS) compatible photonic integrated circuit for high-speed optical interconnect. Dr.Shankar Kumar Selvaraja joined Centre for Nano Science and Engineering at Indian Institute of Science (IISc) in 2014 as an Assistant Professor, where he is heading the Photonics Research Laboratory. He is currently deputy chairman of the National Nanofabrication Center at IISc. He was awarded Early Career Research Award by Department of Science and Technology-Science and Engineering Research Board (DST-SERB), Government of Indian. In 2014, he was awarded Sir Visvesvaraya Young Faculty Research Fellowship by Ministry of Electronics and Information Technology (MeitY), Government of India. He is a senior member of IEEE (Institute of Electrical and Electronics Engineers), Member of OSA (Optical Society of America) and SPIE.  His current area of research includes high-speed Si photonics, Silicon Nitride photonics circuits, microwave photonics, and on-chip mic-IR sensing technology.



    Sushobhan has worked in the field of semiconductor device fabrication technology for more than 10 years, specializing on photovoltaics. His PhD thesis was on organic/Si heterojunction silicon solar cells. He then worked as a post-doctoral research associate in the Princeton Institute of Science and Technology of Materials (PRISM), where he worked on oxide/Si heterojunction solar cells. Since 2014, he has been working an assistant professor in the Indian Institute of Science at the Centre for Nano Science and Engineering (CeNSE), Indian Institute of Science (IISc). In 2014, he was awarded Sir Visvesvaraya Young Faculty Research Fellowship by Ministry of Electronics and Information Technology (MeitY), Government of India. In 2018 he was awarded the Young Engineer Award by the Indian National Academy of Engineers (INAE). He is a young associate of the INAE, member of IEEE (Institute of Electrical and Electronics Engineers), and member of MRS. Sushobhan’s current research interests are thin-film photovoltaics, heterojunction solar cells, and metal-oxide electronics. He has authored over 30 research papers and holds a Taiwanese patent (US and European patent applications pending).Sushobhan is a member of the Administration Committee of the National Nanofabrication Facility at CeNSE. He is also a member of the Institute Safety Committee and Safety warden for CeNSE

    COURSE CERTIFICATE

    • The course is free to enroll and learn from. But if you want a certificate, you have to register and write the proctored exam conducted by us in person at any of the designated exam centres.
    • The exam is optional for a fee of Rs 1000/- (Rupees one thousand only).
    • Date and Time of Exams: 17 November 2019 Morning session 9am to 12 noon; Afternoon Session 2pm to 5pm.
    • Registration url: Announcements will be made when the registration form is open for registrations.
    • The online registration form has to be filled and the certification exam fee needs to be paid. More details will be made available when the exam registration form is published. If there are any changes, it will be mentioned then.
    • Please check the form for more details on the cities where the exams will be held, the conditions you agree to when you fill the form etc.

    CRITERIA TO GET A CERTIFICATE
    • Average assignment score = 25% of average of best 8 assignments out of the total 12 assignments given in the course. 
    • Exam score = 75% of the proctored certification exam score out of 100
    • Final score = Average assignment score + Exam score

    YOU WILL BE ELIGIBLE FOR A CERTIFICATE ONLY IF AVERAGE ASSIGNMENT SCORE >=10/25 AND EXAM SCORE >= 30/75
    • If one of the 2 criteria is not met, you will not get the certificate even if the Final score >= 40/100.
    • Certificate will have your name, photograph and the score in the final exam with the breakup.It will have the logos of NPTEL and IISc Bangalore. It will be e-verifiable at nptel.ac.in/noc.
    • Only the e-certificate will be made available. Hard copies are being discontinued from July 2019 semester and will not be dispatched

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